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22A. M. Wróbel, I. Blaszczyk, A. Walkiewicz-Pietrzykowska, A. Tracz, J. E. Klemberg-Sapieha, T. Aoki and Y. Hatanaka.
Remote hydrogen–nitrogen plasma chemical vapor deposition from a tetramethyldisilazane source. Part 1. Mechanism of the process, structure and surface morphology of deposited amorphous hydrogenated
silicon carbonitride films, J. Mater. Chem., 2003, 13, 731. From organosilicon precursors to multifunctional silicon carbonitride, Russian Journal of General Chemistry C4H15NSi2 Bis(dimethylsilyl)amine, Molecules containing Three or Four Carbon Atoms Silicon-29 NMR data of C4H15NSi2, Chemical Shifts and Coupling Constants for Silicon-29 Reaction of trimethylaluminum and trimethylgallium with bifunctional amines: Syntheses and molecular structures of [Me2Al???N(CH2CH2)2???C???(OCH2)2]2 and [Me2Ga???N(Si(H)Me2)2]2, Journal of Chemical Crystallography Reactions of 1,1,3,3-tetramethyldisilazane with dicobalt octacarbonyl and iron pentacarbonyl. Thermal decomposition of the cobalt and iron carbonyl silazane complexes, Russian Chemical Bulletin Hydridosilazanes hydrolysis-condensation reactions studied by 1H and 29Si liquid NMR spectroscopy, Journal of Sol-Gel Science and Technology The influence of the conditions of synthesis on the composition and mechanical properties of silicon oxycarbonitride nanocomposite films, Protection of Metals and Physical Chemistry of Surfaces Study of chemical bonds and element composition of silicon oxycarbonitride films by the methods of XP-, IR-, and energy-dispersive spectroscopy, Glass Physics and Chemistry The phase composition and physicochemical properties of transparent nanocomposite films of silicon oxycarbonitride, Journal of Structural Chemistry